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胡连军


发布时间:2025-10-28  

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胡连军,男,工学博士,讲师,硕士生导师

教育背景:

2018年9月至2022年6月,河北工业大学,电子科学与技术专业,博士学位

获得荣誉:

指导本科生获得2024年“全国大学生数学建模”省部级一等奖;

指导学生获得2024年“华为杯”第二十一届中国研究生数学建模竞赛国家级二等奖;

指导本科生获得2025年“蓝桥杯”省部级一、二、三等奖各一项;

指导本科生获得2025年“蓝桥杯”国家级三等奖;

指导研究生获得2025年“蓝桥杯”组队赛省部级一等奖;

指导学生成功申报国家级和市级大创项目各一项。

联系方式:hulianjun@tjcu.edu.cn

研究方向:

(1)医学图像处理 (2)芯片缺陷检测 (3)深度学习

代表性成果:

论文:

[1] Hu Lianjun, Sun Qian, Hou Shuping, et al. Multicomponent protection at metal/oxide interfaces: electron-atomic scale mechanism of TT-LYK inhibitor in cobalt chemical mechanical polishing.Langmuir,2025.

[2] Hu Lianjun*, Sun Wenhui, Liu Lingling, et al.  The corrosion inhibition performance and mechanism of α-benzoin oxime on copper: A comprehensive study of experiments and DFT calculations[J]. Colloids and Surfaces A,2024, 700: 134832.

[3] Hu Lianjun*, Chen Qi, Fang Qi, et al. Investigation of the inhibition properties and mechanism of salicylaldoxime for copper corrosion via experimental and theoretical methods[J]. Materials Science in Semiconductor Processing, 2024, 173: 108141.

[4] Hu Lianjun*, Chen Qi, He Jiting, et al. Experimental and computational investigation of salicylhydroxamic acid as a corrosion inhibitor for copper in alkaline solutions[J]. ECS Journal of Solid State Science and Technology, 2024, 13: 094002.

[5] Hu Lianjun*, Pan Guofeng, Chen Qi, et al. Experimental and computational investigation of complexing agents on copper dissolution for chemical mechanical polishing process[J]. Colloids and Surfaces A, 2023, 664: 131142.

[6] Hu Lianjun*, Zhang Xinbo, Wang Hao, et al. Experimental and density functional theory study of complexing agents on cobalt dissolution in alkaline solutions[J]. Electrochimica Acta, 2021, 375: 137977.

[7] Hu Lianjun*, Pan Guofeng, Wang Hao, et al. The synergistic inhibitory effect and density functional theory study of 2,2’- [[(Methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol and potassium oleate on copper in H2O2 based alkaline slurries[J]. Colloids and Surfaces A, 2020, 603: 125275.

[8] Hu Lianjun*, Pan Guofeng, Wang Hao, et al. The synergy and DFT study of TT-LYK and potassium oleate on chemical mechanical polishing of cobalt in alkaline medium[J]. Materials Chemistry and Physics, 2020, 256: 123672.

[9] Hu Lianjun*, Pan Guofeng, Li Can,et al. Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries[J]. Materials Science in Semiconductor Processing, 2020, 108: 104883.

[10] Hu Lianjun*, Pan Guofeng, Xu Yi, et al. The effect of hydroxyethylidene diphosphonic acid on the chemical mechanical polishing of cobalt in H2O2 based alkaline slurries[J]. ECS Journal of Solid State Science and Technology, 2020, 9(3): 034007.

[11] Hu Lianjun*, Pan Guofeng, Zhang Xinbo,  et al. Inhibition effect of  TT-LYK on Cu corrosion and galvanic corrosion between Cu and Co during CMP in alkaline slurry[J]. ECS Journal of Solid State Science and Technology, 2019, 8(8): P437-P447.

[12] 胡连军, 刘建军, 潘国峰*,. 钴化学机械抛光的研究进 展[J].材料导报, 2022, 36(04): 189-198.

项目:

1. 主持.集成电路亚10nm节点钴互连钴膜CMP及其化学腐蚀抑制机理研究(62441405),国家自然科学基金专项项目,2025年.

2. 主持.基于计算化学的集成电路钴基阻挡层CMP及电偶腐蚀抑制机理研究(23JCQNJC00840),天津市青年基金,2023年.

专利

1. 刘玲玲;胡连军;杨惠兰;张亚坤;吴阳.低开关电压应力的双开关高升压直流变换器.授权发明专利号:ZL202310444929.2.

2. 张昂;刘林;刘玲玲;吴阳;张亚坤;胡连军.应用于农业自动化浇灌设备的监测运维系统.授权发明专利号:ZL202411922855.X.



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